Wikipedia / 180 nm process
Wikipedia / 180 nm process
The 180 nm process is a MOSFET (CMOS) semiconductor process technology that was commercialized around the 1998–2000 timeframe by leading semiconductor companies, starting with TSMC and Fujitsu, then followed by Sony, Toshiba, Intel, AMD, Texas Instruments and IBM.
History
The origin of the 180nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS).
Some of the first CPUs manufactured with this process include Intel Coppermine family of Pentium III processors. This was the first technology using a gate length shorter than that of light used for contemporary lithography, which had a wavelength of 193nm.
Some more recent microprocessors and microcontrollers (e.g. PIC) are using this technology because it is typically low cost and does not require upgrading of existing equipment. In 2022, Google sponsored open-source hardware projects using GlobalFoundries 180nm MCU (microcontroller) process on multi-project wafers.
In 1988, an IBM research team led by Iranian engineer Bijan Davari fabricated a 180nm dual-gate MOSFET using a CMOS process. The 180nm CMOS process was later commercialized by TSMC in 1998, and then Fujitsu in 1999.
Processors using 180 nm manufacturing technology
Intel Coppermine E—October 1999
ATI Radeon R100 and RV100 Radeon 7000—2000
Sony PlayStation 2's Emotion Engine and Graphics Synthesizer—March 2000
AMD Athlon Thunderbird—June 2000
AMD Duron Spitfire–June 2000
AMD Duron Morgan–August 2001
Intel Celeron (Willamette)—May 2002
Motorola PowerPC 7445 and 7455 (Apollo 6)—January 2002
Transmeta Crusoe—2000
Transmeta Efficeon (first generation; TM8600 and TM8620)—2004
References